Hole-Mask Colloidal Lithography

November 29, 2007

Hole-mask colloidal lithography (HCL) represents a truly versatile and simple bottom-up nanofabrication method based on colloidal self-assembly lithographic patterning. The HCL technique provides an effective means of patterning vast surface areas with diverse functional nanoarchitectures. Examples include arrays of nanodiscs, oriented elliptical nanostructures, (binary) nanodisc pairs, nanocones on extended surfaces and nanodiscs embedded in a surrounding matrix.

Authors

H. Fredriksson, Y. Alaverdyan, A. Dmitriev, C. Langhammer, D. S. Sutherland, M. Zäch, B. Kasemo

Published in

Advanced Materials 19, 4297-4302

Link

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